We are offering nickel chromium target. Nicr sputtering target composition: ni ( 50-80%)cr(50-20%) purity:99.5-99.9% density: 100% fine grained size size: customise to customer requirement
We are offering niobium pentoxide, nb2ox sputtering target. Nb2ox sputteringtarget ( developed for dc sputtering process) purity:99.99% density:99% low resistivity:
We are offering chromium. Chromium, cr, hipped sputtering target purity: 99.5-99.99% high density:>99% fine grain size size: customise to customer requirement.